Applications related to surface coating technologies such as physical & chemical vapor deposition (PVD, CVD) and vacuum technologies such as turbomolecular pumps (TMP).
Numerical simulations of vacuum pumps can be utilized to predict the pumping performance of new concepts and optimize existing products without the need for expensive experimental campaigns and prototypes. Molecular drag pumps are one of several vacuum pump technologies that are available on the market.
Direct Current (DC) Magnetron Sputtering is an effective method used in thin film deposition processes to create, e.g., a metallic coating on an object. The material used for the coating is released or sputtered from a target (cathode) by bombarding that surface with energetic ions and then condensates on the substrate (anode) surface. In the following the benefits of a magnetron simulation are shown.
